Titanium Target Silicon Sputtering Target Gr5 Gr7 Pvd Coating Machine For PVD

Product Specification

Payment Terms	L/C, D/A, D/P, T/T, Western Union, MoneyGram	Supply Ability	5000 Pieces Per Month
Delivery Time	about 7-14 days for delivery	Packaging Details	All goods are packed by seaworth shipment materials or required by buyer
Manufacturing Method	Hot Isostatic Pressing (HIP)	Cable Length	34 inches
Grip	Knurled	Target Color	Red and White
Sample	available	Tensile Strength	344 MPa
Resolution	1080 x 2400 pixels	Target Type	Hunting
Powder Or Not	not power	Density	4.51 g/cm3
Material	Titanium Alloy	Connectivity	Bluetooth
Applications	Semiconductor, Aerospace, Medical	Color	Silver
Design	Sleek	Brand Name	LHTi
Model Number	Titanium Target	Certification	ISO9001, CE, API,etc
Place of Origin	Baoji, Shaanxi, China
High Light	Gr7 Titanium Target ，Silicon Sputtering Titanium Target ，PVD Vacuum Coating Machine Titanium Target

Titanium Target Silicon Sputtering Target Gr5 Gr7 Pvd Coating Machine For PVD Vacuum Coating Machine

 

 

The word "target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target".

 

From metal titanium to titanium sputtering target

Titanium sputtering target is a titanium product made of titanium metal as raw material, which is used to produce titanium film by sputtering. In brief, there are two methods to manufacture titanium sputtering target with metal titanium casting method and powder metallurgy method.

 

Casting: Melt the raw materials with a certain proportion, pour the alloy solution into the mold to form ingots, and finally machine them into sputtering targets. The method is melting and casting in vacuum.

 

Powder metallurgy: Melt the raw materials with a certain proportion, cast them into ingots, crush them, isostatic press the powder, and then sinter them at high temperature to make targets.

 

 

Product name: Titanium target sputtering

Material: Pure titanium: GR1 GR2

Purity >= 99.6%

Application:Hardware, decoration, tools, ceramics, golf and other coating industries.

Dimension:

Round sputtering target: Φ100×40, Φ95×45, Φ80×40, Φ90×40, Φ85×35 and other specific sizes.

 

Tube sputtering target: Φ70×7×L900--2000mm, Φ89.4mmX7.62mmX1728mm,Φ89.4mmX15mmX1728mm, Φ80mmX10mmX1728mm, and other specific sizes.

 

Plate sputtering target: T6-40×W60--800×L600--2000mm and other specific sizes.

We can customize alloy targets in different proportions according to customer needs

 

 

High purity titanium sputtering targets

 

Product name	Titanium Sputtering Targets for pvd coating machine
Grade	Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc Other materials:chrome,zirconium,copper ,tungsten etc.
Origin	Baoji city, Shaanxi Province,hina
Titanium content	≥99.5 (%)
Impurity content	<0.04(%)
Density	4.51 or 4.50 g/cm3
Standard	ASTM B348 , ASTM B381
Size	1. Round target: Ø30--2000mm, thickness 3.0mm--300mm; 2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm 3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm 4. Customized is available
Technique	Forged and CNC Machined
Application	Semiconductor separation, Film coating materials, Storage Electrode coating, Sputtering coating, Surface coating, Glass coating industry.

 

 

Basic requirements for titanium sputtering targets:

In general, the following indicators will be considered when measuring whether the sputtering target meets the main requirements:

 

Purity: Purity has a great influence on the performance of the sputtered film. Take titanium target as an example, the higher the purity, the better the corrosion resistance, electrical and optical properties of the sputtered film.

 

Impurity content: impurities in the target solid and oxygen and water vapor in the pores are the main pollution sources of the deposition film. Different target materials have different requirements for their impurity content.

 

Density: The density of the target will not only affect the sputtering rate, but also affect the electrical and optical properties of the film. Therefore, in order to reduce the porosity in the target solid and improve the performance of the sputtered film, the target is usually required to have a high density.

 

Grain size and grain distribution: for the same target, the sputtering rate of fine grain target is faster than that of coarse grain target; The smaller the particle size difference (uniform distribution), the more uniform the thickness of the target sputtering deposition film.

 

Chemical requirements

 

 

	N	C	H	Fe	O	Al	V	Pd	Mo	Ni	Ti
Gr1	0.03	0.08	0.015	0.20	0.18	/	/	/	/	/	bal
Gr2	0.03	0.08	0.015	0.30	0.25	/	/	/	/	/	bal
Gr5	0.05	0.08	0.015	0.40	0.20	5.5~6.75	3.5~4.5	/	/	/	bal
Gr7	0.03	0.08	0.015	0.30	0.25	/	/	0.12~0.25	/	/	bal
Gr9	0.03	0.08	0.015	0.25	0.15	2.5~3.5	2.0~3.0	/	/	/	bal
Gr12	0.03	0.08	0.015	0.30	0.25	/	/	/	0.2~0.4	0.6~0.9	bal

 

 

 

Quality Assurance

 

A. According to globally recognized standards, such as ASTM, AMS, ASME. Provide third-party inspection reports. ISO Quality Management System.

 

B. Visual inspection to check surface quality, ensuring without flaw, black dot and other defects.

 

C. Chemical Composition making sure all chemical components can satisfy customer’s demands.

 

D. Mechanical Property testing making sure all titanium products have satisfying mechanical features before delivery.

 

 

 

Material:

1) Ti/Al alloy target (67:33,50:50at%)

 

2) W/Ti alloy target (90:10wt%),

 

3) Ni/V alloy target (93:7, wt%)

 

4) Ni/Cr alloy target (80:20, 70:30, wt%),

 

5) Al/Cr alloy target (70:30,50:50at%)

 

6) Nb/Zr alloy target (97:3,90:10wt%)

 

7) Si/Al alloy target (90:10, 95:5, 98:2, 70:30, wt%)

 

8) Zn/Al alloy target

 

9) High purity chromium target (99.95%, 99.995%)

 

10) Al/Cr alloy target (70:30, 50:50, 67:33, at%)

 

11) Ni/Cu alloy target (70:30, 80:20, wt%)

 

12) Al/Nd alloy target (98:2wt%)

 

13) Mo/Nb alloy target (90:10, wt%)

 

14) TiAlSi alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)

 

15)CrAlSi alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)

 

 

Packing

anium material disk/disc/block dental implant parts

Packing Details : After being tested,qualified products will be packed with Pack PE in wooden box
for collision prevention or we can according your specific needs.

The package of Sputtering Target is very professional, careful and safety.

 

Understanding Titanium Grades

Titanium is classified into various grades based on its composition and properties. Grade 1 (Gr1) is commercially pure titanium, known for its excellent corrosion resistance and high ductility. Grade 2 (Gr2) is also commercially pure but with slightly higher strength, making it suitable for a broader range of applications. Grade 5 (Gr5), also known as Ti-6Al-4V, is an alloy containing aluminum and vanadium, offering superior strength-to-weight ratios, making it ideal for applications that demand high performance under stress.

TiAl alloys, which combine titanium with aluminum, provide enhanced hardness and thermal stability. This makes them particularly valuable for coatings that require excellent wear resistance and performance at elevated temperatures. The unique properties of these titanium grades and alloys make them favorable choices for various PVD applications, where the quality of the coating directly impacts the performance of the final product.

 

The Role of Sputtering Targets in PVD Coating

Sputtering targets are materials that are bombarded by high-speed charged particles during the PVD coating process. When these particles strike the target, atoms are ejected from its surface and deposited onto a substrate, forming a thin film. The choice of target material directly influences the properties of the resulting film, allowing for the customization of coatings to meet specific requirements. By selecting different target materials, such as aluminum, copper, or titanium alloys, manufacturers can produce films with varying characteristics, including super-hardness, wear resistance, and anti-corrosive properties.

In the case of titanium sputtering targets, the ability to produce films that exhibit superior adhesion, low friction, and high hardness is particularly beneficial. These properties are crucial for applications in industries such as aerospace, automotive, and medical technology, where components are subjected to extreme conditions and must maintain integrity over time. By utilizing Gr1, Gr2, Gr5, and TiAl titanium targets, manufacturers can achieve coatings that enhance the performance and longevity of critical components.

 

Advantages of Gr1, Gr2, Gr5, and TiAl Targets

The advantages of using Gr1, Gr2, Gr5, and TiAl titanium sputtering targets are manifold. For starters, the high corrosion resistance of Gr1 and Gr2 makes them suitable for environments that expose materials to aggressive chemicals or seawater. These grades ensure that the coatings maintain their integrity, providing long-lasting protection for underlying substrates.

Gr5 titanium targets, with their exceptional strength, are ideal for high-stress applications, such as in aerospace components where weight savings are critical. The TiAl alloys, on the other hand, excel in high-temperature applications, offering thermal stability that prevents degradation during prolonged exposure to heat. The combination of these advantages allows manufacturers to tailor their coatings to specific operational demands, ensuring that the final products perform optimally in their intended environments.

 

Understanding Sputtering Targets

Sputtering is a deposition technique used to create thin films on various substrates. The process involves bombarding a target material with energetic particles, typically ions, which eject atoms from the target's surface. These ejected atoms then deposit onto a substrate, forming a thin film. Sputtering is favored in medical applications for its ability to produce uniform coatings with precise control over thickness and composition.

Metal targets, including titanium, are particularly valuable in the medical sector due to their favorable mechanical properties, corrosion resistance, and biocompatibility. Titanium, in particular, is widely used for medical applications because of its strength-to-weight ratio and ability to integrate seamlessly with human tissue.

 

The Importance of Titanium in Medical Applications

Titanium is an exceptional material in the medical field, primarily due to its biocompatibility. It does not provoke significant immune responses, making it ideal for long-term implants such as orthopedic prosthetics and dental fixtures. Additionally, titanium's corrosion resistance ensures that it maintains its integrity in the harsh environments often found within the human body.

When used as a sputtering target, titanium can be customized to meet specific requirements for various medical devices. This customization involves adjusting parameters such as purity levels, grain structure, and compactness of the target material, which directly influences the properties of the deposited films.

 

Applications of Sputtering Targets in the Medical Industry

Customized titanium sputtering targets are used in a variety of medical applications, including:

• Orthopedic Implants: Titanium coatings enhance the surface properties of orthopedic devices, improving biocompatibility and reducing wear. This is crucial for implants that endure significant mechanical loads.

• Dental Implants: Sputtered titanium coatings improve the osseointegration of dental implants, promoting better bonding with surrounding bone tissue.

• Surgical Instruments: Coatings applied through sputtering can enhance the hardness and corrosion resistance of surgical tools, prolonging their lifespan and maintaining their performance through repeated sterilization cycles.

• Drug Delivery Systems: Innovative sputtering techniques allow for the development of ultrathin films that can facilitate controlled drug release, improving treatment efficacy.

 

Future Trends in Sputtering Technology

As the medical industry continues to evolve, the role of sputtering technology is becoming increasingly significant. Ongoing research into advanced materials and deposition techniques promises to unlock new possibilities for medical applications. For instance, incorporating nanotechnology into sputtering processes can lead to the development of multifunctional coatings that combine antimicrobial properties with enhanced mechanical strength.

Moreover, the growing emphasis on personalized medicine is driving the demand for customized sputtering targets tailored to individual patient needs. Manufacturers are investing in advanced production methods to create sputtering targets that meet these specific requirements, ensuring that medical devices can provide optimal outcomes.

 

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Titanium in Medical Uses:

Titanium, especially Grade 1 and Grade 2, is highly regarded in medical and biomedical fields for its biocompatibility, strength, and lightweight characteristics. It's commonly used in medical devices because it is not harmful to the body and is not likely to cause allergic reactions.

Key Medical Uses of Titanium:

1. Orthopedic Implants: Titanium is commonly used in bone screws, plates, joint replacements, and spinal implants because it mimics the properties of bone.
2. Dental Implants: Titanium's biocompatibility and strength make it a perfect choice for dental implants that require high durability and resistance to corrosion.
3. Medical Instruments: Due to its corrosion resistance, surgical tools, needles, scalpels, and other medical instruments are often made from titanium or titanium alloys.
4. Prosthetics: Titanium is used in the production of prosthetic limbs and implants for its combination of lightweight and strength.
5. Cardiovascular Devices: Titanium is used in the production of pacemaker cases, stents, and valves due to its non-reactive nature in the human body.
6. Wear-resistant coatings: Titanium sputtering targets can be used to deposit thin coatings on medical devices to enhance wear resistance, reduce friction, and improve biocompatibility.

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Titanium Grades:

Chemical requirements
	N	C	H	Fe	O	Al	V	Pd	Mo	Ni	Ti
Gr1	0.03	0.08	0.015	0.20	0.18	/	/	/	/	/	bal
Gr2	0.03	0.08	0.015	0.30	0.25	/	/	/	/	/	bal
Gr5	0.05	0.08	0.015	0.40	0.20	5.5~6.75	3.5~4.5	/	/	/	bal
Gr7	0.03	0.08	0.015	0.30	0.25	/	/	0.12~0.25	/	/	bal
Gr12	0.03	0.08	0.015	0.30	0.25	/	/	/	0.2~0.4	0.6~0.9	bal

 

Conclusion:

 

Titanium alloy sputtering targets, including TiAl alloys, are versatile materials widely used for coating applications in industries ranging from aerospace to electronics and biomedical. These materials provide exceptional properties such as strength, corrosion resistance, biocompatibility, and wear resistance, making them ideal for demanding applications that require durable, high-performance thin films. When choosing a titanium sputtering target, factors like alloy composition, purity, and target geometry must be considered to achieve optimal results in the sputtering process.